We are pleased to announce that our latest research article has been published in the prestigious special issue of Colloid and Polymer Science, dedicated to the 60th birthday of Stephan Förster (View all publications). Our article „Advances in scalable plasmonic nanostructures: towards phase-engineered interference lithography for complex 2D lattices“ is a collaborative effort by Swagato, Olha, and Tobi.
Our research focuses on the scalable fabrication of complex plasmonic nanostructures, which one can use for controlled drying of colloidal suspensions. Our theoretical work shows how one can successfully fabricate complex 2D lattice geometries such as hexagonal, Lieb, honeycomb, and Kagome lattices with high precision over large areas. We introduce phase-engineered interference lithography (PEIL) as a method to achieve this complex nanostructure and demonstrate its potential through optical design and electromagnetic simulations.
Our results show that these advanced plasmonic gratings support surface lattice resonances with exceptionally narrow line widths of 1 nm, offering significant improvements in refractive index sensors with up to ten times higher sensitivity. This work paves the way for innovative applications in colloidal plasmonics using conventional self-assembly methods.
We are honored to contribute to this special issue and invite you to explore our research here.
Release announcement: Special issue honoring Stephan Förster
